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The SOI Papers at VLSI ’14 (Part 2): Thumbnail

The SOI Papers at VLSI ’14 (Part 2):

Posted by on July 17, 2014
In Conferences, Editor's Blog, Paperlinks, R&D/Labnews
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Last week we posted Part 1 of our round-up of SOI papers at the VLSI Symposia – which included the paper showing that 14nm FD-SOI should match the performance of 14nm bulk FinFETs. (If you missed Part 1, covering the three big 14nm FD-SOI and 10nm FinFET papers, click here to read it now.) This […]

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The SOI Papers at VLSI ’14 (Part 1): Breakthroughs in 14nm FD-SOI, 10nm SOI-FinFETs Thumbnail

The SOI Papers at VLSI ’14 (Part 1): Breakthroughs in 14nm FD-SOI, 10nm SOI-FinFETs

Posted by on July 11, 2014
In Conferences, Editor's Blog, Paperlinks, R&D/Labnews
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The VLSI Symposia – one on technology and one on circuits – are among the most influential in the semiconductor industry. Three hugely important papers were presented – one on 14nm FD-SOI and two on 10nm SOI FinFETs – at the most recent symposia in Honolulu (9-13 June 2014). In fact, three out of four […]

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IEDM ’13 (Part 2): More SOI and Advanced Substrate Papers Thumbnail

IEDM ’13 (Part 2): More SOI and Advanced Substrate Papers

Posted by on December 19, 2013
In Conferences, Editor's Blog, Paperlinks
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SOI and other advanced substrates were the basis for dozens of excellent papers at IEDM ’13.  Last week we covered the FD-SOI papers (click here if you missed that piece). In this post, we’ll cover the other major SOI et al papers – including those on FinFETs, RF and various advanced devices. Brief summaries, culled […]

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The FD-SOI Papers at IEDM ’13 Thumbnail

The FD-SOI Papers at IEDM ’13

Posted by on December 16, 2013
In Conferences, Editor's Blog, Paperlinks
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FD-SOI was a hot topic at this year’s IEEE International Electron Devices Meeting (IEDM) (www.ieee-iedm.org), the world’s showcase for the most important applied research breakthroughs in transistors and electronics technology. The FD-SOI papers featured high performance, low leakage, ultra-low power (0.4V),  excellent variability, reliability and scalability down to the 10 nm node using thin SOI […]

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The IEEE S3S Conference Delivered Impressive Technical Content Thumbnail

The IEEE S3S Conference Delivered Impressive Technical Content

Posted by on November 18, 2013
In Conferences
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The new IEEE S3S conference promised rich content, as it merged both The IEEE International SOI Conference and the IEEE Subthreshold Microelectronics Conference, completed by an additional track on 3D Integration. The result was an excellent conference, with outstanding presentations from key players in each of the three topics covered. This quality was reflected in the increased attendance: almost 50% more […]

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SOI – 3D Integration – Subthreshold Microelectronics: Register now for the IEEE S3S! Thumbnail

SOI – 3D Integration – Subthreshold Microelectronics: Register now for the IEEE S3S!

Posted by (ARM) on September 13, 2013
In Conferences
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Last May, we already let you know about the IEEE S3S conference, founded upon the co-location of The IEEE International SOI Conference and the IEEE Subthreshold Microelectronics Conference, completed by an additional track on 3D Integration. Today, we would like let you know that the advance program is available, and to attract your attention on […]

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GlobalFoundries On Cost vs. Performance for FD-SOI, Bulk and FinFET Thumbnail

GlobalFoundries On Cost vs. Performance for FD-SOI, Bulk and FinFET

Posted by on July 3, 2013
In Editor's Blog
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According to Shigeru Shimauchi, Country Manager, GlobalFoundries Japan, for the same level of performance, the die cost for 28nm FD-SOI will be substantially less than for 28nm bulk HPP (“high performance-plus”). Specifically, to get a 30%  increase in performance over 28nm bulk LPS PolySiON, HPP increases die cost by 30%, while FD-SOI only increases die […]

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Which will hit the 14nm jackpot first: FD-SOI or FinFET? Gauntlet down. Race on. Thumbnail

Which will hit the 14nm jackpot first: FD-SOI or FinFET? Gauntlet down. Race on.

Posted by on June 21, 2013
In Editor's Blog
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STMicroelectronics CTO Jean-Marc Chery threw down the gauntlet when he told Electronics Weekly, “We must be ready with 14nm FD-SOI before anyone has FinFET at 14nm.” Can they do it? Yes, they can. Unlike FinFETs, Planar FD-SOI is not a disruptive technology – FD-SOI is an extension of the planar CMOS we all know and […]

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Fully-Depleted SOI (and more) at VLSI (Kyoto): some knock-your-socks-off papers Thumbnail

Fully-Depleted SOI (and more) at VLSI (Kyoto): some knock-your-socks-off papers

Posted by on June 12, 2013
In Advanced Substrate Corners, Conferences, Editor's Blog, Paperlinks
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Look for some breakthrough FD-SOI and other excellent SOI-based papers coming out of the 2013 Symposia on VLSI Technology and Circuits in Kyoto (June 10-14). By way of explanation, VSLI comprises two symposia: one on Technology; one on Circuits. However, papers that are relevant to both are presented in “Jumbo Joint Focus” sessions. Here’s a […]

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The Paul Scherrer Institute reports that they have achieved strained silicon nanowires with the highest strain ever Thumbnail

The Paul Scherrer Institute reports that they have achieved strained silicon nanowires with the highest strain ever

Posted on December 4, 2012
In Industry Buzz
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Starting on SOI, the Paul Scherrer Institute reports in Nature that they have achieved strained silicon nanowires with the highest strain ever (4.5% elastic strain). The principle of the method used for achieving a high stress in silicon: Firstly, the forces act in all directions in the silicon layer. If small parts of the layer […]

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