Leti: Adding Strain to FD-SOI for 20nm and Beyond
Posted by Olivier FAYNOT and Francois ANDRIEU (CEA-Leti) on April 30, 2012In Advanced Substrate Corners, ASN #19, R&D/Labnews
Tagged with 14nm, 20nm, 28nm, design, FD-SOI, foundry, high-perf, highperf, Leti, low-power, modelling, R&D, SOC, sSOI, strain
Work at Leti shows that strain is an effective booster for high-performance at future nodes. The outstanding electrostatic performance already reported for planar FD-SOI technology can be improved by the use of ION boosters in order to target-high performance applications, as already demonstrated in the past. As illustrated in Figure 1, strain can be incorporated …
Continue ReadingLeave a Comment









