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IBM: FinFET Isolation Considerations and Ramifications – Bulk vs. SOI Thumbnail

IBM: FinFET Isolation Considerations and Ramifications – Bulk vs. SOI

Posted by (IBM) on April 18, 2013
In Advanced Substrate Corners, Design & Manufacturing, In & Around Our Industry, R&D/Labnews
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Fully-depleted transistor technologies, both planar and fin-type, are now in the mainstream for product designs. One of the many interesting topics in the new 3D FinFET technology is the approach to isolation. In this article, key elements that differentiate junction-isolated (bulk) and dielectric-isolated (SOI) FinFET transistors are discussed, encompassing aspects of process integration, device design, …

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GF’s Two Flavors of FD-SOI – Kengeri Explains (Exclusive ASN Q&A) Thumbnail

GF’s Two Flavors of FD-SOI – Kengeri Explains (Exclusive ASN Q&A)

Posted on April 15, 2013
In Design & Manufacturing, In & Around Our Industry
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Hearing the news that GlobalFoundries would be offering two flavors of FD-SOI, ASN asked the company to explain the strategy further. Here are the responses provided by Subi Kengeri, Vice President of Advanced Technology Architecture. What do you see as the FD-SOI benefits for chip designers? Lower SRAM Vmin for retention and lower operating Vmin …

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Common Platform Technology Forum 2013: SOI Highlights Thumbnail

Common Platform Technology Forum 2013: SOI Highlights

Posted by on February 11, 2013
In Editor's Blog
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The 2013 Common Platform Technology Forum showcased “the latest technological advances being delivered to the world’s leading electronics companies,” so of course SOI-based topics were well-represented. Happily, those of us who weren’t able to get over to Silicon Valley were able to attend “virtually” via a live stream (which is now reposted – click here …

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Design Highlights: ST-Ericsson’s 28nm FD-SOI SmartPhone/Tablet Chip Thumbnail

Design Highlights: ST-Ericsson’s 28nm FD-SOI SmartPhone/Tablet Chip

Posted by on January 21, 2013
In Editor's Blog
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Just Posted: FD-SOI video & white paper. Just as this blog was going online, ST-Ericsson posted an excellent, in-depth white paper; and in partnership with STMicroelectroics, a YouTube video detailing the how’s and why’s of FD-SOI.Here are the links — you really don’t want to miss these: • Multiprocessing in Mobile Platforms: the Marketing and …

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ST-Ericsson’s 28nm FD-SOI SmartPhone/Tablet Chip at Vegas – a Great Start to 2013 Thumbnail

ST-Ericsson’s 28nm FD-SOI SmartPhone/Tablet Chip at Vegas – a Great Start to 2013

Posted by on January 14, 2013
In Editor's Blog
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What a great start to 2013: at CES in Las Vegas, ST-Ericsson announced the NovaThor™ L8580 ModAp, “the world’s fastest and lowest-power integrated LTE smartphone platform.” This is the one that’s on STMicroelectronics’ 28nm FD-SOI, with sampling set for Q1 2013. And it’s a game changer – for users, for designers, for foundries, and for …

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Want Silicon Proof? Check Out the Fully-Depleted Tech Symposium During SF/IEDM Thumbnail

Want Silicon Proof? Check Out the Fully-Depleted Tech Symposium During SF/IEDM

Posted by on December 4, 2012
In Editor's Blog
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If you want to cut through the noise surrounding the choices for 28nm and beyond, an excellent place to start is the SOI Consortium’s Fully Depleted Technology Symposium. As a member of the design and manufacturing communities, this is your chance to see and hear what industry leaders are actually doing. Planar? FinFET? The Consortium’s …

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IBM: Why Fin-on-Oxide (FOx/SOI) Is Well-Positioned to Deliver Optimal FinFET Value Thumbnail

IBM: Why Fin-on-Oxide (FOx/SOI) Is Well-Positioned to Deliver Optimal FinFET Value

Posted by (IBM) on November 30, 2012
In Advanced Substrate Corners, ASN #20, Design & Manufacturing, In & Around Our Industry, R&D/Labnews
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FinFET technology promises continued scaling of CMOS technology via the potential to reduce (deleterious) short- channel effects. Realization of this potential is highly dependent on the ideality of the fin structure and, in particular, the uniformity of fin width and impurity doping. The fin isolation technology has a strong impact on within-fin uniformity and variability, …

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Which wafers for energy-efficient, fully-depleted transistor technologies? Thumbnail

Which wafers for energy-efficient, fully-depleted transistor technologies?

Posted by (Soitec) on November 21, 2012
In ASN #20, Design & Manufacturing, In & Around Our Industry
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To drive the competitiveness of PCs, smartphones and other leading-edge devices, the electronics industry has relied for decades on the continued miniaturization of the multitude of transistors integrated in the chips at the heart of those products. However, at the tiny dimensions transistors are reaching today, conventional technology is becoming ineffective to satisfactorily combine higher …

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Cadence announced the tapeout of a 14nm test-chip featuring an ARM Cortex®-M0 processor implemented using IBM’s SOI FinFET process technology.

Posted on November 9, 2012
In Industry Buzz
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Cadence announced the tapeout of a 14nm test-chip featuring an ARM Cortex®-M0 processor implemented using IBM’s SOI FinFET process technology. Leveraging Cadence tools and SOI’s built-in di-electric isolation for the ARM processor, SRAM memory and other blocks, a goal of the test-chip is to validate characterization data for FinFET-based ARM Artisan® physical IP.

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Wafer Leaders Extend Basis for Global SOI Supply Thumbnail

Wafer Leaders Extend Basis for Global SOI Supply

Posted by on October 10, 2012
In ASN #20, Editor's Blog, In & Around Our Industry
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It’s a bright green light from the world leaders in SOI wafer capacity. Soitec, the world leader in SOI wafer production, and long-time partner Shin-Etsu Handatai (SEH), the world’s biggest producer of silicon wafers, have extended their licensing agreement and expanded their technology cooperation. SEH is a $12.7 billion company, supplying over 20% of the …

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