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FD-SOI Workshop in SF Follows ISSCC – Registration (Free!) Now Open Thumbnail

FD-SOI Workshop in SF Follows ISSCC – Registration (Free!) Now Open

Posted on February 7, 2012
In Advanced Substrate Corners, Conferences
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Want to learn first-hand what’s going on in the world of FD-SOI? (aka Fully-Depleted Silicon-On-Insulator) The SOI Industry Consortium, CEA-Leti and Soitec are organizing the 6th edition of the Fully Depleted Workshop. Presentations will be given by experts from ST, ARM, IBM, Leti, UCBerkeley, Soitec, Accelicon & the SOI Consortium. It’s a full-day event at …

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Driving Roadmaps

Posted on October 15, 2011
In Advanced Substrate Corners, ASN #18, Conferences
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Highlights from the IEEE 2011 SOI Conference include presentations by ST, ARM, IBM, Intel, Leti, Peregrine, GlobalFoundries and more. The 2011 IEEE SOI Conference, held in Tempe, AZ this past October was not one to miss. Highlights include excellent and insightful papers from ST, ARM, IBM, Intel, Leti, Peregrine and GlobalFoundries, plus many more that …

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FD SOI: Movers & Shakers at Tokyo Workshop Thumbnail

FD SOI: Movers & Shakers at Tokyo Workshop

Posted on December 8, 2010
In Advanced Substrate Corners, ASN #16, Conferences
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The third installment in the SOI Consortium’s ongoing FD SOI Workshop series, the Tokyo event was a major success. The University of Tokyo recently hosted a hugely successful one-day workshop on the FD SOI ecosystem’s readiness. The event took place on Saturday, the 25th of September 2010, at the University of Tokyo’s Komaba Research Campus, …

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The 2010 IEEE SOI Conference Thumbnail

The 2010 IEEE SOI Conference

Posted on December 8, 2010
In Advanced Substrate Corners, ASN #16, Conferences
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For 35 years the IEEE/Electron Devices Society’s SOI Conference has been the premier meeting of engineers and scientists dedicated to current trends in SOI. The papers presented at the IEEE/EDS SOI Conference give a good indication of what’s in the pipeline for the industry. This year’s hot topics included FD-SOI, energy efficiency, modeling and design, …

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Breakthroughs at the IEDM

Posted on May 27, 2009
In Advanced Substrate Corners, ASN #12, Conferences
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The IEEE’s International Electron Devices Meeting (IEDM) is the world’s showcase for the most important applied research breakthroughs in transistors and electronics technology. Here are a few highlights from some of the papers that presented advances in SOI-based devices and architectures at the most recent meeting (December 2008, San Francisco).

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Less Than Ever

Posted by Nobuyuki SUGII (Hitachi) on May 27, 2009
In Advanced Substrate Corners, ASN #12, Conferences
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Hitachi demonstrates why it has the smallest Vth variability, and identifies the remaining components of random doping fluctuation. In a “Comprehensive Study on Vth Variability in Silicon on Thin BOX (SOTB) CMOS with Small Random-Dopant Fluctuation: Finding a Way to Further Reduce Variation,” (N. Sugii et. al., IEDM 2008) Hitachi scientists at the Central Research …

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Sources Discovered

Posted by Olivier FAYNOT (CEA-Leti) on May 27, 2009
In Advanced Substrate Corners, ASN #12, Conferences
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Leti, Soitec and ST have discovered the sources of threshold voltage variation in undoped, ultrathin FD-SOI architectures. At the most recent IEDM conference, researchers from Leti, Soitec and STMicroelectronics presented a paper entitled, “High Immunity to Threshold Voltage Variability in Undoped Ultra-Thin FDSOI MOSFETs and its Physical Understanding” (O. Weber et al, IEDM 2008).

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The Basics

Posted on May 27, 2009
In Advanced Substrate Corners, ASN #12, Conferences
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IEDM’08 Conquering the Challenge of Threshhold Voltage Variability At the most basic level, a transistor is turned on if the gate voltage is higher than the threshold voltage. That makes reducing variability in threshold voltage (which can be abbreviated as either σVth or σVt) critical.

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