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Articles by Jean-Pierre RASKIN

Jean-Pierre RASKIN

Jean-Pierre RASKIN has written 2 articles on Advanced Substrate News.

Jean-Pierre RASKIN received his PhD degree from the Université catholique de Louvain (UCL), Belgium, in 1997. In 1998, he joined the University of Michigan, Ann Arbor, USA, as a research fellow. Since 2000 he has been a professor at UCL. His research interests are SOI technology in the RF domain and the use of NEMS to extract intrinsic material properties at the nanometer scale.

SOITEC and UCL boost the RF performance of SOI substrates Thumbnail

SOITEC and UCL boost the RF performance of SOI substrates

Posted by and (Soitec) on December 4, 2013
In Advanced Substrate Corners, Design & Manufacturing, In & Around Our Industry, Professor's Perspective, R&D/Labnews
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Soitec and a team from UCL have been working together to identify the technological opportunities to further improve the high-frequency performance of SOI substrates. Based on the wideband characterization techniques developed at UCL, the RF characteristics of high-resistivity (HR) SOI substrates have been analyzed, modeled and greatly improved in order to meet the specifications of […]

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MEMS in thin film SOI Thumbnail

MEMS in thin film SOI

Posted by (UC Louvain) on May 27, 2009
In Advanced Substrate Corners, ASN #12, Professor's Perspective
Tagged with ,

SOI is major contender for heterogeneous applications. The advantages of SOI technology for building thin film sensors on membranes as well as three-dimensional (3D) surface micromachined sensors and actuators have been demonstrated over these last years. The flatness and robustness of the thin membrane as well as the self-assembling of out-of-plane 3D microstructures rely on […]

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