ETSOI Substrates: What We Needi
Posted by Bruce DORIS (IBM) on July 26, 2010In ASN #15, Design & Manufacturing, In & Around Our Industry
Tagged with ETSOI, foundry, IBM
IBM’s roadmap to ETSOI – Extremely Thin Silicon on Insulator – calls for very thin, very flat SOI substrates. Here’s why. ETSOI transistors are thin-channel planar devices. Halo implantation is used to control electrostatics in conventional transistors. Although the halo controls the short channel effects, it also causes large random doping fluctuations and increases junction …
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